Observing two stage recovery of gate oxide damage created under negative bias temperature stress

نویسندگان

  • Thomas Aichinger
  • Michael Nelhiebel
  • Sascha Einspieler
  • Tibor Grasser
چکیده

negative bias temperature stress Thomas Aichinger, Michael Nelhiebel, Sascha Einspieler, and Tibor Grasser KAI (Kompetenzzentrum Automobil-und Industrieelektronik), Europastrasse 8, 9524 Villach, Austria Infineon Technologies Austria, Siemensstrasse 2, 9500 Villach, Austria Christian Doppler Laboratory for TCAD, Institute for Microelectronics, Technische Universität Wien, Gusshausstrasse 27-29, 1040 Wien, Austria

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تاریخ انتشار 2010